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KISE Journal of Korean Institute of Surface Engineering 2003;36(5):386-392. Published online: Nov, 30, -0001
The electroplating process for a solder bump which can be applied for a flip chip was studied. Si-wafer was used for an experimental substrate, and the substrate were coated with UBM (Under Bump Metallization) of Al(400 nm)/Cu(300 nm)Ni(400 nm)/Au(20 nm)
키워드 lead-free solder;Sn-Cu;electroplating;microstructure;joint strength;