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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 37(3); 2004
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2004;37(3):158-163. Published online: Nov, 30, -0001
ITO 박막의 공정변수에 따른 특성 연구
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한국기술교육대학교, 신소재공학과;한국기술교육대학교, 신소재공학;한국기술교육대학교, 신소재공학과;
초록
ITO thin film was deposited on the glass by RF magnetron sputtering. Dependance of the process parameters such as thickness, target-to-substrate distance, substrate temperature and oxygen partial pressure on the transmittance and electrical resistance of
키워드 Indium Tin Oxide (ITO);RF Sputtering;Process parameters;Transmittance;Sheet resistance;