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KISE Journal of Korean Institute of Surface Engineering 2004;37(3):169-174. Published online: Nov, 30, -0001
MgO thin films were reactively deposited using an internal inductively coupled plasma assisted sputtering method varying reactive gas ratio to get stoichiometric film composition, and bipolar dc substrate bias to suppress micro arcs. The minimum frequency
키워드 Plasma display panel;MgO;Inductively coupled plasma;Sputtering;