학회 연락처
- +82-2-563-0935
- +82-2-558-2230
- submission@kssse.or.kr
- https://www.kssse.or.kr/
KISE Journal of Korean Institute of Surface Engineering 2005;38(2):55-59. Published online: Nov, 30, -0001
ITO/Ni/ITO thin films were deposited on the PET by RF magnetron sputtering. Dependance of the process parameters such as deposition pressure, positions of Ni layer, on the transmittance, reflectance and sheet resistance of ITO/Ni/ITO film were investigate
키워드 indium Tin Oxide[ITO];RF Sputtering;Ni;Transmittance;Sheet resistance;