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KISE Journal of Korean Institute of Surface Engineering 2005;38(2):73-78. Published online: Nov, 30, -0001
A real-time monitoring of ICP(inductively coupled plasma) assisted magnetron sputtering of MgO was carried out using a QMS(quadrupole mass spectrometer), an OES(optical emission spectrometer), and a digital oscilloscope with a high voltage probe and a cur
키워드 Plasma display panel;MgO;Inductively coupled plasma;Sputtering;