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KISE Journal of Korean Institute of Surface Engineering 2005;38(4):174-178. Published online: Nov, 30, -0001
Chemical vapor deposition technique has been used to grow epitaxial SiC thin films on Si wafers using tetramethylsilane(TMS) precursor. The films were observed to grow along (110) direction of 3C-SiC at
키워드 Nanocrystalline film;Siiicon carbide;SiC;LPCVD;TMS;