학회 연락처
- +82-2-563-0935
- +82-2-558-2230
- submission@kssse.or.kr
- https://www.kssse.or.kr/
KISE Journal of Korean Institute of Surface Engineering 2006;39(3):87-92. Published online: Nov, 30, -0001
The characteristic of interface layer and the effect of bias voltage on the microstructure of c-BN films were studied in the microwave plasma hot filament C.V.D process. c-BN films were deposited on a high speed steel(SKH-51) substrate by hot filament CVD
키워드 c-BN films;Bias voltage;Microwave plasma hot filament C.V.D Process;Resistance wear coating tool;