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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 41(6); 2008
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2008;41(6):279-286. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2008.41.6.279
수치모델을 이용한 ICP-CVD 장치의 증착 균일도 해석
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군산대학교 공과대학 신소재공학과, 플라즈마 소재 응용 센터;
초록
Numerical analysis is done to investigate which would be the most influencing process parameter in determining the uniformity of deposition thickness in TiN ICP-CVD(inductively coupled plasma chemical vapor deposition). Two configurations of ICP antenna a
키워드 Plasma;Chemical vapor deposition;Fluid simulation;