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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 41(6); 2008
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2008;41(6):287-291. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2008.41.6.287
기판바이어스 인가에 따른 반응성 마그네트론 스퍼터링에 의한 TiN 코팅
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목포대학교 신소재공학과;목포대학교 신소재공학과;
초록
Reactively magnetron sputtered TiN films were deposited on Si wafers under varying bias voltage and characterized by X-ray diffraction, field-emission scanning electron microscopy and Nanoindentation. The films deposited under an Ar +
키워드 Reactive magnetron sputtering;TiN coating;Substrate bias;Microstructure;