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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 43(3); 2010
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2010;43(3):154-158. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2010.43.3.154
수치모델을 이용한 pulsed dc bias ICP장치의 플라즈마 특성 해석
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군산대학교 공과대학 신소재공학과, 플라즈마 소재 응용 센터;
초록
Numerical analysis is done to investigate the effects of pulse bias on the plasma processing characteristics like ion doping and ion nitriding by using fluid dynamic code with a 2D axi-symmetric model. For 10 mTorr of Ar plasma, -1 kV of pulse bias was si
키워드 Inductively coupled plasma;Uniformity;Fluid simulation;Pulse bias;