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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 43(3); 2010
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2010;43(3):159-164. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2010.43.3.159
신경망을 이용한 SiN 박막 표면거칠기에의 이온에너지 영향 모델링
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세종대학교 전자공학과;세종대학교 정보통신공학과;
초록
Surface roughness of deposited or etched film strongly depends on ion bombardment. Relationships between ion bombardment variables and surface roughness are too complicated to model analytically. To overcome this, an empirical neural network model was con
키워드 Surface roughness;Neural network;Model;Silicon nitride;Ion energy;