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- KISE Journal of Korean Institute of Surface Engineering
- Volume 43(4); 2010
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2010;43(4):194-198. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2010.43.4.194
Properties of Indium Doped Zinc Oxide Thin Films Deposited by RF Magnetron Sputtering
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Department of Materials Science and Engineering, Pusan National University;Department of Materials Science and Engineering, Pusan National University;Nano Convergence Practical Application Center, Daegu Technopark;Department of Materials Science and Engin
초록
Indium doped zinc oxide films (ZIO) were deposited on non-alkali glass substrates by radio frequency (RF) magnetron sputtering at room temperature. The structural, electrical and optical properties of the ZIO films were investigated as a function of their
키워드 ZnO;ZIO;TCO;RF magnetron sputtering;