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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 44(2); 2011
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2011;44(2):39-43. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2011.44.2.039
수소 가스 분율(H2/H2+SiH4)에 따른 비정질 실리콘 박막의 표면 및 구조 분석
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한국 폴리텍II대학 인천캠퍼스 신소재응용학과;
초록
Amorphous silicon thin film was deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD). Each films were prepared in different dilution in the chamber gas. As a result, silicon crystallites and crystal volume fraction was increased with raising the
키워드 PE CVD;XRD;a-Si;Optical bandgap;AFM;