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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 44(4); 2011
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2011;44(4):131-136. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2011.44.4.131
A Kinetic Study on the Growth of Nanocrystalline Diamond Particles to Thin Film on Silicon Substrate
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Department of Advanced Materials Engineering, Korea Polytechnic University;Department of Advanced Materials Engineering, Korea Polytechnic University;
초록
A kinetic study has been made for the growth of nanocrystalline diamond (NCD) particles to a continuous thin film on silicon substrate in a microwave plasma chemical vapor deposition reactor. Parameters of deposition have been microwave power of 1.2 kW, t
키워드 Nanocrystalline diamond film;Microwave plasma CVD;Nucleation and growth;Arrhenius equation;Activation energy;