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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 44(4); 2011
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2011;44(4):155-164. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2011.44.4.155
전자빔 증발원을 이용한 물질의 증발 특성
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포항산업과학연구원 융합소재연구본부;포항산업과학연구원 융합소재연구본부;포항산업과학연구원 융합소재연구본부;포항산업과학연구원 융합소재연구본부;포항산업과학연구원 융합소재연구본부;
초록
Electron beam evaporation source is widely used to prepare thin films by physical vapor deposition because it is very effective to vaporize materials and there is virtually no limit to vaporize materials including metals and compounds such as oxide. In th
키워드 Electron beam evaporation source;Crucible and crucible liner;Evaporation characteristics;Thin films;Physical vapor deposition;