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KISE Journal of Korean Institute of Surface Engineering 2012;45(3):106-110. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2012.45.3.106
Oblique angle deposition (OAD) is a physical vapor deposition where incident vapor flux arrives at non-normal angles. It has been known that tilting the substrate changes the properties of the film, which is thought to be a result of morphological change
키워드 Oblique angle deposition;Cathodic arc deposition;TiN films;Indentation hardness;