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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 45(4); 2012
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2012;45(4):168-173. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2012.45.4.168
반응성 증착용 펄스 플라즈마 공정의 진단
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군산대학교 신소재공학과, 플라즈마 소재응용센터;
초록
A real-time monitoring of an immersed antenna type inductively coupled plasma (ICP) was done with optical emission spectroscopy (OES) to check the reports that sputtered atom density is decreasing as the ICP power is increased. At 10 mTorr pressure of Ar,
키워드 Inductively coupled plasma;Sputtering;Optical emission spectroscopy;