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KISE Journal of Korean Institute of Surface Engineering 2012;45(5):206-211. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2012.45.5.206
Process analysis was carried out during deposition of MgO by inductively coupled plasma assisted reactive magnetron sputtering in Ar and
키워드 MgO;ICP;QMS;Reactive magnetron sputtering;