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KISE Journal of Korean Institute of Surface Engineering 2013;46(1):29-35. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2013.46.1.029
The effect of DC bias on the growth of nanocrystalline diamond films on silicon substrate by microwave plasma chemical vapor deposition has been studied varying the substrate temperature (400, 500, 600, and
키워드 Nanocrystalline diamond;Microwave plasma CVD;Nucleation and growth;