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- KISE Journal of Korean Institute of Surface Engineering
- Volume 47(1); 2014
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2014;47(1):20-24. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2014.47.1.020
Crystallization of Amorphous Silicon Films Using Joule Heating
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Department of Materials Science and Engineering, Hongik University;
초록
Joule heat is generated by applying an electric filed to a conductive layer located beneath or above the amorphous silicon film, and is used to raise the temperature of the silicon film to crystallization temperature. An electric field was applied to an i
키워드 Crystallization;Poly-Si;AMOLED;Joule heating;