Aug, 31, 2024

Vol.57 No.4

최신논문 논문목록
논문검색
논문 상세 검색
학회 연락처

상세보기

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 48(2); 2015
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 2015;48(2):38-42. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2015.48.2.38

이산화 티타늄 위에서의 원자층 증착법 백금의 성장 특성

  • 김현구;이한보람;
    인천대학교 신소재공학과;인천대학교 신소재공학과;
초록

Atomic layer deposition (ALD) is essential for the fabrication of nanoscale electronic devices because it has excellent conformality, atomic scale thickness control, and large area uniformity. Metal thin films are one of the important material components

키워드 $TiO_2$;Pt;Atomic Layer Deposition;$O_3$;Nucleation;