Aug, 31, 2024

Vol.57 No.4

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 49(1); 2016
  • Article

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KISE Journal of Korean Institute of Surface Engineering 2016;49(1):98-103. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2016.49.1.98

Inductively Coupled Plasma를 이용한 SnO 박막의 식각 특성 연구

  • 김수곤;박병옥;이준형;김정주;허영우;
    나노융합기술원;경북대학교 신소재공학부;경북대학교 신소재공학부;경북대학교 신소재공학부;경북대학교 신소재공학부;
초록

The dry etching characteristics of SnO thin films were investigated using inductively coupled plasma (ICP) in Ar, $CF_4$, $Cl_2$ chemistries. the SnO thin films were deposited by reactive rf magnetron sputtering with Sn metal target.

키워드 SnO thin Film;Inductively Coupled Plasma;Etching;