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KISE Journal of Korean Institute of Surface Engineering 2017;50(5):352-359. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2017.50.5.352
The growth of nanocrystalline diamond films on a p-type poly silicon substrate was studied using microwave plasma chemical vapor deposition method. A 6 mm thick poly silicon plate was mirror polished and scratched in an ultrasonic bath containing slurries
키워드 Nanocrystalline diamond;Diamond slurry;Ion bombardment;Microwave plasma chemical vapor deposition;Nucleation and growth;