Aug, 31, 2024

Vol.57 No.4

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 51(4); 2018
  • Article

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KISE Journal of Korean Institute of Surface Engineering 2018;51(4):231-236. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2018.51.4.231

P-type Electrical Characteristics of the Amorphous La2NiO4+δ Thin Films

  • Hop, Dang-Hoang;Lee, Jung-A;Heo, Young-Woo;Kim, Jeong-Joo;Lee, Joon-Hyung;
    School of Materials Science and Engineering, Kyungpook National University;School of Materials Science and Engineering, Kyungpook National University;School of Materials Science and Engineering, Kyungpook National University;School of Materials Science an
초록

We report p-type electrical characteristics of the amorphous $La_2NiO_{4+{delta}}$ thin films which were sputtered on the glass substrates using an RF sputtering system. As-deposited thin films at room temperature and $300^{circ}C$ w

키워드 Lanthanum nickel oxide;thin film;amorphous;RF magnetron sputtering;p-type;