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KISE Journal of Korean Institute of Surface Engineering 2019;52(4):211-226. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2019.52.4.211
Optical thin films were deposited by using a reactive pulsed DC magnetron sputtering method with a high density plasma(HDP). In this study, the effect of sputtering process conditions on the microstructure and optical properties of
키워드
antireflection film;Pulsed DC magnetron sputtering;multi-layer optical thin film;