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KISE Journal of Korean Institute of Surface Engineering 2019;52(6):342-349. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2019.52.6.342
Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N2/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied wit
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