학회 연락처
- +82-2-563-0935
- +82-2-558-2230
- submission@kssse.or.kr
- https://www.kssse.or.kr/
KISE Journal of Korean Institute of Surface Engineering 2020;53(2):67-71. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2020.53.2.67
For deposition technology using plasma, it plays an important role in improving film deposited with high ionization rate through high density plasma. Various deposition methods such as high-power impulse magnetron sputtering and ion-beam sputtering have b
키워드 Inductively coupled plasma;Inductively coupled plasma assisted magnetron sputtering;Hafnium nitride;