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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 53(5); 2020
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2020;53(5):201-206. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2020.53.5.201
대기압 유전체배리어방전으로 합성 및 산화 처리된 SiOxCy(-H) 박막의 부식방지 특성
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한밭대학교 신소재공학과;한밭대학교 신소재공학과;
초록
A SiOxCy(-H) thin film was synthesized by atmospheric pressure dielectric barrier discharge(APDBD), and a SiO2-like layer was formed on the surface of the film by oxidation treatment using oxygen plasma. Hexamethylcyclotrisiloxane was used as a
키워드 Dielectric barrier discharge;Polymerization;Anti-corrosion;Silicon dioxide;Chemical vapor deposition;