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KISE Journal of Korean Institute of Surface Engineering 2020;53(5):265-270. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2020.53.5.265
We investigated mechanochemical radical, which is concomitant with chemical lift-off lithography(CLL), on the self-assembled monolayer(SAM)/electrodes and a polydimethylsiloxane(PDMS) using a colorimetric and a spectroscopic method. The 11-mercaptoundecan
키워드 Chemical Lift-Off lithography(CLL);Mechanochemistry;Self-Assembled Monolayer(SAM);Radical;Bond Breaking;