Aug, 31, 2024

Vol.57 No.4

최신논문 논문목록
논문검색
논문 상세 검색
학회 연락처

상세보기

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 22(4); 1989
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 1989;22(4):215-220. Published online: Nov, 30, -0001

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플라즈마 실리콘 질화막의 전기적 특성에 관한 연구

  • 주현성;주승기;
    서울대학교 금속공학과;서울대학교 금속공학과;
초록

Silicon Nitride whose thickness is about $100AA$by the ellipsometer was successfully formed by the Plasma reaction. Nitrogen Plasma was formed by applying the 200KHz, 500Watt power between the two electroes and nitridation of silicon was carrie

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