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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 25(3); 1992
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 1992;25(3):133-143. Published online: Nov, 30, -0001
HCD플라즈마를 이용한 반응성 이온플레이팅법에 의한 TiN 코팅
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서울대학교 전기공학과;서울대학교 전기공학과;
초록
Titanium nitride(TiN) films have been prepared by HCD plasma enhanced reactive ion plating. Density and temperature of the plasma generated by the HCD were investigated. It was shown that parameters such as the substrate bias voltage(0 350V) and N2 flow
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