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상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 26(3); 1993
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 1993;26(3):127-134. Published online: Nov, 30, -0001
도판트가 주입된 비정질 실리콘 박막의 재결정화에 따른 전기적 성질의 비교
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한양대학교 무기재료공학과;한양대학교 무기재료공학과;현대전자(주) 반도체연구소;
초록
P+ and BF2+ were implanted to LPCVD amorphous silicon films deposited on thermally-oxidized silicon wafers and the low temperature annealing process followed with various conditions to activate implanted ions and to recrystallize the films. We tried to fi
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