Aug, 31, 2024

Vol.57 No.4

최신논문 논문목록
논문검색
논문 상세 검색
학회 연락처

상세보기

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 27(2); 1994
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 1994;27(2):83-90. Published online: Nov, 30, -0001

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WSi$_2$이상산화 기구에 대한 조사

  • 이재갑;김창렬;김우식;이정용;김차연;
    국민대학교 금속재료공학과;금성일렉트론(주);금성일렉트론(주);한국과학기술원 전자재료공학과;금성사(주);
초록

We have investigated the mechanism for the abnormal oxide growth occuring during oxidation of the crystalline tungsten silicide. TEM and XPS analysis reveal the abnormaly grown oxide layer consisting of crystalline $Wo_3$ and amorphous $Si

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