Aug, 31, 2024

Vol.57 No.4

학회 연락처

상세보기

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 27(3); 1994
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 1994;27(3):143-148. Published online: Nov, 30, -0001

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절삭공구용 Ti(C, N)피막의 HCD식 이온도금시 공정변수의 영향

  • 강형호;고경현;안재환;
    아주대학교 재료공학과;아주대학교 재료공학과;아주대학교 재료공학과;
초록

Effects of process variables of HCD ion plating on the film composition of Ti(C, N) were analyzed. The mole ratio of carbon to nitrogen and that of non-metal to titanium in the film primarily depend on the partial pressure ratio of ($C-2H_2$/

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