Aug, 31, 2024

Vol.57 No.4

학회 연락처

상세보기

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 27(5); 1994
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 1994;27(5):253-260. Published online: Nov, 30, -0001

PDF

반응성 스퍼터링방법으로 증착된 Ta-N 박막의 미세구조 분석

  • 민경훈;김기범;
    서울대학교 금속공학과;서울대학교 금속공학과;
초록

Ta-N films were reactively sputter deposited by dc magnetron sputtering from a Ta target with a various Ar-N, gas ratio. Electrical resistivity of pure Ta film was 150$mu$$Omega$cm and decreased initially with nitrogen addition, and

키워드