Aug, 31, 2024

Vol.57 No.4

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상세보기

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 29(5); 1996
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 1996;29(5):487-493. Published online: Nov, 30, -0001

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LOW TEMPERATURE DIAMOND GROWTH USING MICROWAVE PLASMA CVD

  • Sakamoto, Yukihiro;Takaya, Matsufumi;Shinohara, Kibatsu;
    Chiba Institute of Technology;Chiba Institute of Technology;Nihon Koshuha, CO., Ltd;
초록

Diamond films were grown at lower temperatures (630-813K) on Si, Al (1100P), and Al-Si(8A, 8B, BC) alloy substrates using improved microwave plasma CVD apparatus in a mixed methane and hydrogen plasma. Improved microwave plasma CVD apparatus equipped wate

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