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KISE Journal of Korean Institute of Surface Engineering 1996;29(5):512-518. Published online: Nov, 30, -0001
Amorphous carbon nitride (a-C:N) multilayerfilms are formed by using altermating conditions during film deposition in are ion plating process. Because hard a-C:N films prepared with suitable megative bias voltages have large compressive stress, it is diff
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