Aug, 31, 2024

Vol.57 No.4

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 29(6); 1996
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 1996;29(6):781-787. Published online: Nov, 30, -0001

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EVALUATION OF WATER REPELLENCY FOR SILICON OXIDE FILMS PREPARED BY RF PLASMA-ENTRANCED CVD

  • Sekoguchi, Hiroki;Hozumi, Atsuhi;Kakionoki, Nobuyuki;Takai, Osamu;
    Department of Materials Processing Engineering, Nagoya University;Department of Materials Processing Engineering, Nagoya University;Department of Materials Processing Engineering, Nagoya University;Department of Materials Processing Engineering, Nagoya Un
초록

Silicom oxide films with good water repellency were prepared by rf plasma-enhanced CVD (rf-PECVD) using four kinds of organosilicon compound, which had different number of methyl ($CH_3$) groups, and oxygen as gas sources. The differences in th

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