Aug, 31, 2024

Vol.57 No.4

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상세보기

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 32(3); 1999
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 1999;32(3):467-471. Published online: Nov, 30, -0001

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DEPOSITION OF c-BN FILMS BY PULSED DC BIASING IN MAGNETICALLY ENHANCED ARE METHOD

  • Lee, S.H.;Byon, E.S.;Lee, K.H.;J., Tian;Yoon, J.H.;Sung, C.;Lee, S.R.;
    Korea Institute of Machinery & Materials;Korea Institute of Machinery & Materials;Korea Institute of Machinery & Materials;Harbin Institute of Technology;Changwon National University;Center for Advanced Materials,University of Massachusetts,Lowell,MA 0185
초록

BN films were grown on silicon (l00) substrate by magnetically enhanced activated reactive evaporation (ME-ARE) with pulsed DC power instead of r.f. for substrate biasing. The deposited films were analyzed using Fourier transform infrared spectroscopy (FT

키워드 cubic boron nitride film;ME-ARE;pulsed DC;