Aug, 31, 2024

Vol.57 No.4

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 34(5); 2001
  • Article

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KISE Journal of Korean Institute of Surface Engineering 2001;34(5):403-408. Published online: Nov, 30, -0001

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Global Warming Gas Emission during Plasma Cleaning Process of Silicon Nitride Using C-C$_4$F$_8$O Feed Gas with Additive $N_2$

  • Kim, K.J.;C.H. Oh;Lee, N.E.;Kim, J.H.;J.W. Bae;G.Y. Yeom;S.S. Yoon;
    Dept. of Materials Engineering, Sungkyunkwan University;Dept. of Materials Engineering, Sungkyunkwan University;Dept. of Materials Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University;Dept. of Materials Engineering, Sungk
초록

In this work, the cyclic perfluorinated ether (c-C$_4$F$_{8}$O) with very high destructive removal efficiency (DRE) than other alternative gases, such as $C_3$F$_{8}$, c-C$_4$F$_{8}$ and NF

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