Aug, 31, 2024

Vol.57 No.4

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 34(5); 2001
  • Article

상세보기

KISE Journal of Korean Institute of Surface Engineering 2001;34(5):435-444. Published online: Nov, 30, -0001

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The electrochemical properties of PVD-grown WC-( $Ti_{1-x}$A $I_{x}$)N multiplayer films in a 3.5% NaCl solution

  • S.H. Ahn;J.H. Yoo;Kim, J.G.;Lee, H.Y.;J.G. Han;
    Center for Advanced Plasma Surface Technology(CAPST), SungKyunKwan University;Center for Advanced Plasma Surface Technology(CAPST), SungKyunKwan University;Center for Advanced Plasma Surface Technology(CAPST), SungKyunKwan University;Center for Advanced P
초록

WC-( $Ti_{1-x}$ A $l_{x}$) N coatings of constant changing Al concentration were deposited on S45C substrates by high-ionization sputtered PVD method. The Al concentration could be controlled by using evaporation source for Al and fi

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