Aug, 31, 2024

Vol.57 No.4

학회 연락처

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 34(5); 2001
  • Article

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KISE Journal of Korean Institute of Surface Engineering 2001;34(5):510-515. Published online: Nov, 30, -0001

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Growth and characterization of BON thin films prepared by low frequency RF plasma enhanced MOCVD method

  • G.C. Chen;D.C. Lim;Lee, S.B.;B.Y. Hong;Kim, Y.J.;J.H. Boo;
    Center for Advanced Plasma Surface Technology, SungKyunKwan University;Center for Advanced Plasma Surface Technology, SungKyunKwan University;Center for Advanced Plasma Surface Technology, SungKyunKwan University;Center for Advanced Plasma Surface Technol
초록

It was first time that low frequency R.F. derived plasma enhanced MOCVD with frimethylborate precursor was used to fabricate a new ternary compound $BO_{x}$ $N_{y}$ . The formation of BON molecule was resulted from nitrogen nitrifyin

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