Aug, 31, 2024

Vol.57 No.4

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 36(1); 2003
  • Article

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KISE Journal of Korean Institute of Surface Engineering 2003;36(1):14-21. Published online: Nov, 30, -0001

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Deposition of ZrO$_2$ and TiO$_2$ Thin Films Using RF Magnet ron Sputtering Method and Study on Their Structural Characteristics

  • Shin, Y.S.;Jeong, S.H.;Heo, C.H.;Bae, I.S.;Kwak, H.T.;Lee, S.B.;Boo, J.H.;
    Department of Chemistry and Center for Advanced Plasma Surface Technology, SungKyunKwan University;Department of Chemistry and Center for Advanced Plasma Surface Technology, SungKyunKwan University;Department of Chemistry and Center for Advanced Plasma Su
초록

Thin films of ZrO$_2$ and TiO$_2$ were deposited on Si(100) substrates using RF magnetron sputtering technique. To study an influence of the sputtering parameters, systematic experiments were carried out in this work. XRD data show t

키워드 ZrO$_2$ and TiO$_2$ thin films;RF magnetron sputtering;Phase transition;Deposition parameter effects;