학회 연락처
- +82-2-563-0935
- +82-2-558-2230
- submission@kssse.or.kr
- https://www.kssse.or.kr/
상세보기
- KISE Journal of Korean Institute of Surface Engineering
- Volume 36(1); 2003
- Article
상세보기
KISE Journal of Korean Institute of Surface Engineering 2003;36(1):27-33. Published online: Nov, 30, -0001
Pulsed Magnetron Sputtering Deposit ion of DLC Films Part I : Low-Voltage Bias-Assisted Deposition
-
Inst. of High Current Electronics, Siberian Div. of RAS;School of Materials Science and Engineering, ReMM, University of Ulsan;School of Materials Science and Engineering, ReMM, University of Ulsan;School of Materials Science and Engineering, ReMM, Univer
초록
Pulsed magnetron sputtering of graphite target was employed for deposition of diamond-like carbon (DLC) films. Time-resolved probe measurements of magnetron discharge plasma have been performed. It was shown that the pulsed magnetron discharge plasma dens
키워드 Diamond-like carbon;Graphite;Pulsed magnetron sputtering;Low-voltage bias;