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KISE Journal of Korean Institute of Surface Engineering 2003;36(2):109-115. Published online: Nov, 30, -0001
Quaternary Ti-Al-Si-N films were deposited on WC-Co substrates by a hybrid deposition system of arc ion plating (AIP) method for Ti-Al source and DC magnetron sputtering technique for Si incorporation. The synthesized Ti-Al-Si-N films were revealed to be
키워드 Ti-Al-Si-N;Superhardess;Nanocomposite;Hybrid deposition system;