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KISE Journal of Korean Institute of Surface Engineering 2003;36(2):141-147. Published online: Nov, 30, -0001
Silicon carbide thin film was deposited in APCVD and LPCVD system with 1,3-DSB precursor 1,3-DSB is the single precursor to deposit SiC on Si at low temperature. SiC film was deposited at
키워드 SiC;CVD;precursor;